Doping is the process of intentionally introducing small amounts of impurities, known as dopants, into a pure semiconductor material, such as silicon. This technique alters the electrical properties of the semiconductor, enhancing its conductivity and enabling the creation of electronic components like diodes and transistors. There are two main types of doping: n-type, which adds electrons, and p-type, which creates 'holes' or positive charge carriers. Doping is a fundamental process in the manufacturing of integrated circuits and other electronic devices, allowing precise control over their electrical behavior and performance.